Abstract
In this paper, AlGaN channels for high electron mobility transistors (HEMTs) have been evaluated based on a power device figure of merit. AlGaN-channel HEMTs grown on SiC substrates by plasma-assisted molecular beam epitaxy (PAMBE) were fabricated. Maximum saturation current of 0.55 A/mm was obtained at VGS=1 V. Current-gain cutoff ( ft) and power-gain cutoff ( fmax) frequencies obtained from small signal measurements were ft=13.2 GHz and fmax=41 GHz. Pulsed current–voltage (I–V) measurements at 200 ns showed no dispersion in I–V curves. Large signal continuous wave (CW) measurement yielded an output power density of 4.5 W/mm with power added efficiency (PAE) of 59% at 4 GHz. This work demonstrates the potential of AlGaN channel HEMTs for high voltage switching and microwave power applications.
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