Abstract
The use of optical interconnects in systems incorporating complex Si circuits could significantly reduce the number of wire interconnects required for such systems. One possible approach to the development of optical interconnects is the monolithic integration of AlGaAs optoelectronic devices and Si circuits. However, the differences in crystal properties between GaAs and Si present a severe impediment to the growth of high-quality GaAs on Si. This paper will review recent advances in lasers and other opto-electronic devices fabricated on MGS substrates.
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