Abstract
The authors report the positive and negative ion time-of-flight secondary ion mass spectrometry characterization of a thin film of e-beam evaporated alumina on a silicon substrate using Bi3++ primary ions at 50 keV, where this film prevents poisoning of a Fe catalyst in carbon nanotube growth. The positive ion spectrum showed a strong Al+ signal, while the negative ion spectrum showed strong peaks due to AlO−, AlO2−, AlO3H2−, and OH−.
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