Abstract

This article presents the lamb wave contour mode resonators (CMRs) based on 22% aluminum scandium nitride (AlScN) thin film with λ of 12-24 [Formula: see text], and operating in [Formula: see text] mode. We report the design, fabrication, and characterization of 500 nm-thick AlScN CMRs, which take advantage of optimized stress control of co-sputtered AlScN thin films and vertical inductively coupled plasma (ICP) etching profile. The experimental results are compared to theoretical predictions by finite element analysis (FEA). All Al 0.78 Sc [Formula: see text] devices show excellent agreement with simulations in piezoelectric coupling using modified AlScN film parameters. The best Al 0.78 Sc [Formula: see text] CMR has achieved an electromechanical coupling coefficient ( kt2) of 5.24% and loaded quality factor ( Q ) of 1219 with an operating frequency at approximately 300 MHz, which exhibits a high Figure-of-Merit (FoM) of 63.88 in piezoelectric microelectromechanical system (MEMS) lamb wave CMR. This article also presents the co-sputtering characteristics of the AlScN thin films under [Formula: see text] gas to achieve low-stress and high-quality piezoelectric materials, and the etching optimization of high concentration Sc doping aluminum nitride (AlN) thin films under Cl2/BCl3/Ar chemistry to obtain record profile angle of 77°, high selectivity of 1:1 with SiO2 hard mask.

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