Abstract
A synthetic material with large thermoelectric anisotropy has been prepared from a metal–semiconductor multilayer structure. By an alloying process, a multilayer stack A–B–A…, where A and B are pure aluminum and n-silicon, is produced with a thermoelectric anisotropy ΔS=S‖−S⊥≅1.5mV∕K, where S‖ and S⊥ are the absolute Seebeck coefficients along and perpendicular to the layers, respectively. The use of this synthetic material for light sensing applications is demonstrated.
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