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Abstract
The behaviour of the electrical resistance of thin reactively deposited NiCr films during aging in air is rather complex and is often non-monotonic. A simple model explaining the first stages of the aging behaviour of such films is developed. The main feature of the model is the assumed selective oxidation of the chromium component leading to a simultaneous change in the thickness and composition of the remaining conducting film. By describing the film resistivity in terms of percolation theory and using a relation between the metal composition and the resistivity of the bulk material the aging curves of the resistance can be calculated from its dependence on the film composition, which is determined by the deposition process, and on the aging temperature. Although the model does not include structural effects such as annealing or segregation during aging the change in the aging curves obtained for NiCr films deposited under various conditions can now be calculated in satisfactory agreement with experimental results.
Published Version
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