Aggregate-Free Deposition of Highly Organized Nanocomposite Silica Thin Films on Conductive Substrates By Electrochemically Induced Templated Sol-Gel Synthesis

Abstract

The synthesis of ordered nanocomposite or nanoporous silica thin films by template-assisted sol-gel processes offers interesting applications in various fields including catalysis, sensors, membranes and energy. The electrochemically assisted self-assembly method allows the growth of highly ordered vertically aligned nanoporous silica thin films on conductive substrates. This orientation, optimized for high mass-transport capabilities, is difficult to obtain by classical approaches. The method involves submerging the conductive substrate in a pre-hydrolyzed precursor liquid followed by the application of a cathodic potential, thereby causing the electrogeneration of hydroxide ions. The pH increase in the diffusion layer near the electrode surface catalyzes the sol-gel formation and the result is a silica thin film that grows on the conductive substrate. The addition of cetyltrimethylammonium bromide (CTAB) micelle templates leads to the formation of a highly ordered nanostructure.A fundamental limitation of the method as reported in the literature is that the maximum layer thickness which can be obtained is rather limited due to the formation of aggregate by-products. In our contribution we show that diffusion layer thickness control is essential to obtain aggregate-free layers. Silica formation is catalyzed by OH- formed in the electrode’s diffusion layer, which quickly grows up to hundreds of microns under stationary conditions, thereby leading to composite thin films as well as precipitation of aggregates. By using a rotating disc electrode, the hydrodynamic layer is controlled, enabling aggregate-free film growth over a wide thickness range. Additionally, thin film coatings on high aspect ratio micropillar structures were demonstrated. Parameters such as precursor age, deposition temperature and deposition current were systematically investigated and the deposits were characterized using SEM, ellipsometry, TEM, FT-IR and an electrochemical redox probe. Using these techniques, we demonstrated the controlled growth of aggregate-free, uniform and nanostructured thin films with high mass-transport capabilities and thicknesses of 20 nm up to 15 µm, thereby significantly expanding the range of 50-150 nm as reported in literature. These results are explained using a single hydrodynamic layer model. Figure 1