Abstract
Zr 0.44 Al 0.56 N 1.20 films were deposited by reactive arc evaporation on WC–Co substrates. As-deposited films have a defect-rich NaCl-cubic and wurtzite phase mixture. During annealing at 1100 °C the films undergo simultaneous recovery of the ZrN-rich c-ZrAlN nanoscale domains and formation of semicoherent w-ZrAlN nanobricks, while the excess nitrogen is released. This process results in an age hardening effect as high as 36%, as determined by nanoindentation . At 1200 °C, the w-AlN recrystallizes and the hardening effect is lost.
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