Abstract
This study reports a novel method for fabricating a nickel nanomesh mold using phase shift lithography, suitable for use in large-area touch screen panel applications. Generally, the values of light transmittance and sheet resistance of metal mesh transparent conducting electrode (TCE) films are determined by the ratio of the aperture to metal areas. In this study, taking into consideration the optimal light transmittance, sheet resistance, and pattern visibility issues, the line width of the metal mesh pattern was ~1 µm, and the pitch of the pattern was ~100 µm. In addition, a novel method of manufacturing wiring electrodes using a phase shift lithography process was also developed and evaluated. A TCE film with a size of 370 mm × 470 mm was prepared and evaluated for its light transmittance and sheet resistance. In addition, wiring electrodes with a length of 70 mm were fabricated and their line resistances evaluated by varying their line width.
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