Abstract
An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb-shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius. [DOI: 10.1380/ejssnt.2011.293]
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