Abstract
Atomic force microscopy (AFM) was used to investigate ultrathin films of poly (5-amino-1-naphthol) (PAN) deposited by Langmuir–Schaefer (LS) and Langmuir–Blodgett (LB) on silicon substrates. The AFM probe was also used to perform nano-indentation and nano-delamination of the polymeric film. By measuring the applied vertical force at the beginning of the delamination process and by using an appropriate model for micro-indentation of elastic continuous systems, we estimate the critical interfacial shear strength for the PAN/Si interface as being approximately 160 MPa, which indicates that the polymer adheres well to the substrate. The conditions to obtain multiple depositions of the polymeric film on Si substrates are also described. The multilayer PAN films obtained by associating the LS and LB methods were very smooth and uniform, with approximately 5 nm/monolayer.
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