Abstract
We discuss the phenomenon of the moiré fringe phase multiplication encountered under incoherent superimposition of quasiperiodic structures. Its application to increase the in-plane displacement sensitivity of the AFM nano-moiré technique is demonstrated. The principle is based on the spatial beating effect between the Mth harmonic of the nonsinusoidal profile quasiperiodic specimen and the first harmonic of the reference grating. Implementations using digitally generated reference grating and resampled AFM image are described. Numerical simulations and experiments with intermediate polymer stamps used in nanoimprint lithography illustrate and corroborate the proposal.
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