Advantages of UV210 polymer for integrated optics applications: comparison of ridge and photoinscripted strip waveguide performances

Abstract

We report on the propagation performance comparison of two waveguide structures obtained from the same UV210 photoresist. Ridge waveguide structures were fabricated by deep ultraviolet photolithography, and photoinscripted strip waveguides were realized by the same process, excluding the last development step. Structural and optical studies were carried out for both waveguide families, highlighting a well-controlled photolithography process. Predictions of the propagating modes were also led using the beam propagation method, showing a good agreement with experiments in single-mode propagation. Propagation losses were evaluated at 635 nm by cut-back measurement, showing mean loss values that are slightly lower for photoinscripted waveguides than for ridge waveguides. UV210 photoinscripted waveguides thus combine a fast and low-cost process, reduced optical losses, and a planar surface with as many advantages for more complex integrated components.