Abstract
The use of interferometry to measure transparent and semi-transparent films is becoming more and more important as understanding of the measurement becomes more widespread. Techniques for measurement of thick films of 1 μm or greater using interferometry have been available for some time but measurement of thin films using interferometry is a much newer technique, also the effect of films coatings on interferometry measurements in general is now becoming more widely understood. The measurement of thick and thin films using interferometry is discussed in this paper.
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