Abstract
Vanadium (IV) oxide (VO2) layers have received extensive interest for applications in smart windows to batteries and gas sensors due to the multi-phases of the oxide. Among the methods utilized for their growth, chemical vapour deposition is a technology that is proven to be industrially competitive because of its simplicity when performed at atmospheric pressure (APCVD). APCVD’s success has shown that it is possible to create tough and stable materials in which their stoichiometry may be precisely controlled. Initially, we give a brief overview of the basic processes taking place during this procedure. Then, we present recent progress on experimental procedures for isolating different polymorphs of VO2. We outline emerging techniques and processes that yield in optimum characteristics for potentially useful layers. Finally, we discuss the possibility to grow 2D VO2 by APCVD.
Highlights
General InformationCVD is a practical method of atomistic or near atomistic deposition having the ability to synthesize well-controlled dimensions and structures at reasonably low temperatures, high purity and in multiple formats such as single layer, multi-layer, composite and functional coatings
A thin film is deposited by chemical reaction or decomposition of the gas mixture on the substrate surface or in its vicinity at a defined temperature
It is vital for production of thin films to deliver the gas phase precursors with a carrier gas
Summary
CVD is a practical method of atomistic or near atomistic deposition having the ability to synthesize well-controlled dimensions and structures at reasonably low temperatures, high purity and in multiple formats such as single layer, multi-layer, composite and functional coatings. Reactor systems in CVD processes must allow controlled transport of the reactant and diluent gases to the reaction zone, maintain a defined substrate temperature and safely remove the gaseous. Reactor systems in CVD processes must allow controlled transport of the reactant and diluent by-products These functions should be fulfilled with sufficient control and maximal effectiveness, gases to the reaction zone, maintain a defined substrate temperature and safely remove the gaseous which requires optimum engineering design and automation. To coat layers using Chemical Vapour Deposition at deposition takes place is the essential part of the system and must be designed according to Atmospheric Pressure (APCVD), four basic types can be classified according to their gas flow and the specific chemical process parameters.
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