Advanced pattern data processing technique for a raster scan electron beam exposure system

Abstract

With the increasing complexity and integration in recent LSI designs, the amount of data to be processed in EB exposure systems tends to increase steadily. This increase in data may lead to degradation in the systems’ throughputs. An overall technique associated with both software and hardware presents a realistic solution to this problem. Parallel processors combined with a simplified data format have provided efficient data manipulation. A compaction method working on smaller stripe areas is easily realized in hardware, yet can achieve significant data reduction. The data edit function, operating asynchronously with the data preparation procedure, eliminates repeated processing of identical chip patterns or chip element patterns. The feasibility of the technique thus featured has been proven on EB-105, a raster scan electron beam exposure system.