Advanced Oxidation of Diuron by Photo-Fenton Treatment as a Function of Operating Parameters

Abstract

Advanced oxidation of diuron in aqueous solution by photo-Fenton treatment was investigated by batch experiments. Effects of operating parameters, namely, the concentrations of pesticide (diuron), hydrogen peroxide (H 2 O 2 ), and ferrous ion [Fe (II)] on oxidation of diuron were investigated by using Box-Behnken statistical experiment design and the response surface methodology. Diuron oxidation by photo-Fenton treatment was evaluated by determining the total organic carbon (TOC), diuron, and adsorbable organic halogen (AOX) removals. Concentration ranges of the reagents resulting in the highest level of diuron oxidation were determined. Diuron removal increased with increasing H 2 O 2 and Fe (II) concentrations, up to a certain level. H 2 O 2 concentration had a more profound effect than diuron and Fe (II) on removal of diuron, TOC, and AOX from the aqueous solution. Complete (100%) disappearance of diuron was achieved after a 15 min reaction period. However, 85% of diuron was mineralized after 240 min, indicating a low level of intermediate formation. Optimal H 2 O 2 /Fe (II)/diuron ratio resulting in maximum diuron (100%), TOC (85%), and AOX (100%) removals was found to be 267/36/25 (mg L -1 ).