Abstract
Precisely engineered systems of nanoscale multilayers are essential device components in X-ray optics for spectrometry and in synchrotron applications. Their fabrication and optimization require processing control by high-resolution microstructure characterization. Methods of TEM have proven to be indispensable in quantitatively assessing properties like multilayer periodicity, orientation, or interface roughness, and in correlating the microstructure with X-ray reflectivity [1, 2].
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