Advanced micromachine fabrication using ion-implanted layers

Abstract

To apply ion implantation to micromachining, we fabricated microstructures using a micropatterned mask and subsequent etching based on the different etch rates of the substrate and of the ion-implanted structure. As examples, a micromesh and cantilever beam were fabricated from a silicon substrate by etching with KOH solution after gold, carbon or titanium ion implantation. Distinctive three-dimensional structures are fabricated by ion implantation at different implantation depths. Although these structures show slight deflections due to residual stresses, they are still applicable in practical uses. The problem of diffraction can be solved by optimizing the fabrication conditions.