Abstract
Four porous ultra low-k spin-on dielectric materials from different manufacturers were characterized using X-ray reflectivity (XRR), grazing-incidence small angle X-ray scattering (GI-SAXS), transmission electron microscopy (TEM) and electrical leakage methods and their results are compared. It is shown that X-ray methods can rapidly, accurately and repeatably determine the thickness and density of the low-k film and can provide valuable insights into the pore structure, which may be able to help predict electrical leakage in the low- k material.
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