Abstract
In order to realize dual-periodic microstructured surfaces, which are required for next-generation multi-functional surfaces for various fields, multi-exposure laser interference lithography (MELIL) is recognized as one of the potential fabrication methods. However, MELIL has one critical problem that it is difficult to adjust each exposure energy for adequate multiple exposures before the development process. To solve this critical problem, we proposed an application of special optical in-process measurement, allowing us to control each exposure condition properly during its exposure process, and experimentally verified its feasibility by generating a desired dual-periodic microstructured surface using the proposed developed system with an in-process measurement unit.
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