Abstract
Adsorption of transition metal ions such as Fe(III), Ni(II), and Zn(II) on silicon wafers in ammoniac hydrogen peroxide solution (SC‐1 solution) has been studied. It was found by comparing the experimental results with the equilibrium calculations that the main adsorption species is the dissolved neutral hydroxide complex. This was supported by the calculated free energy change of adsorption of hydroxide complexes.
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