Abstract
Adsorption behavior of benzotriazole (BTAH) on a copper surface has been investigated using electrochemical impedance spectroscopy (EIS), UV adsorption spectra, and attenuated total reflectance infrared spectroscopy. The formation of BTAH film adsorbed on the copper surface has been characterized by atomic force microscopy (AFM). EIS results revealed that BTAH was chemisorption onto copper surface. Three models were established to analyze adsorption dynamics. Adsorption of BTAH was in accord with the Langmuir adsorption isotherm when adsorption-desorption reached equilibrium state. BTAH film growth can best be represented by exponential decay law assuming the concentration of BTAH was constant over time. Higher-order model was established to evaluate adsorption dynamics considering the variation of BTAH concentration in the bulk solution. UV measurements demonstrate that this higher-order model fitted well to the experimental data.
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