Adsorption and reactions of ethylsilane on Si(100)

Abstract

The adsorption and thermal decomposition of ethylsilane was studied on the Si(100) 2 × 1 reconstructed surface using high resolution electron energy loss spectroscopy and temperature programmed desorption mass spectrometry. Ethylsilane dissociatively adsorbed on the surface at a saturation coverage of approximately 0.25 monolayers. Thermal decomposition of ethylsilane proceeded by β-hydride elimination, resulting in the desorption of ethylene at 700 K. Hydrogen adsorbed on the substrate as the 2 × 1 monohydride and desorbed at approximately 800 K, leaving behind a carbon-free surface.