Abstract

The interactions of H, O 2, NO and H 2O with the Si(111)(7×7) surface have been studied using high-resolution vibrational electron energy loss spectroscopy with in-situ combined supplementary techniques (low-energy electron diffraction and Auger electron spectroscopy). Adsorbed states and adsorbed structures of these gases on the Si(111) surface at 300 K are examined. Results of temperature-dependent measurements are presented, and surface reaction mechanisms and surface species produced by the thermal treatment are discussed.

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