Abstract
A high-resolution core-level spectroscopy investigation of the adsorption of oxygen onAl(111) at variable oxygen exposure demonstrates a low surface reactivity foran intensively cleaned surface. The threshold for oxide formation is as high as∼200 L (langmuirs), at which point the coverage of the chemisorbed oxygen exceeds half a monolayer.A simple model is presented, using which it is possible to deduce the oxygen coverage fromthe core-level spectra and determine the initial sticking probability. For our data a value of0.018 ± 0.004 is obtained. The changes in core-level spectra following low-temperature annealing oflow-coverage O/Al(111) reflect the formation of gradually larger islands of oxygen atoms(Ostwald ripening). The island formation is consistent with a random-walk model fromwhich the diffusion barrier can be deduced to be in the range of 0.80–0.90 eV.
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