Adjustment of the Plasma Flow Density in the Process of Coating Formation

Abstract

The vacuum-arc plasma sources are widely used as a solution of technological problems for coating deposition. Use of high density accelerated ion flows allows to obtain good adhesion. However, the feature of metal plasma generators is lack of flexible adjustment of the plasma flow density during coating formation. The solutions of this problem without changing the evaporators' design are offered, that allows to control the structure, physical and chemical properties of surface layers and gives the possibility to considerably expand the list of technical problems to be solved.