Abstract
AbstractAluminum is one of the most significant plasmonic materials for its advantage of low cost, natural abundance, as well as the ultraviolet optical response. However, it is still very challengeable for the fabrication of aluminum plasmonic nanogaps, which greatly limits the applications of aluminum plasmonics considering the essential role of nanogaps for electric field enhancement. Here, the reliable patterning of aluminum plasmonic nanogaps employing a modified “Sketch and Peel” lithography strategy is demonstrated. By introducing a self‐assembled monolayer to engineer the surface energy of the substrate, the adhesiveness of the aluminum film outside outline template is significantly decreased to implement the selective peeling process. Besides, the near‐infrared Fano resonance in the periodic aluminum heptamers has been first revealed by enabling the strong electric field and plasmon coupling in the aluminum nanostructures with 10 nm scale nanogaps. In addition, surface‐enhanced Raman spectroscopy and infrared spectroscopy are also illustrated in the rationally designed aluminum dimers. The present work provides a robust method to obtain aluminum plasmonic nanogaps, which may play an important role on the practical applications of aluminum plasmonics, such as surface‐enhanced vibration spectroscopy and nonlinear optics.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
