Abstract
Aberrations affect the focal spot quality in direct laser write applications when focusing through a refractive index mismatch. Closed loop adaptive optics can correct these aberrations if a suitable feedback signal can be found. Focusing an ultrafast laser beam into transparent dielectric material can lead to plasma formation in the focal region. We report using the supercontinuum emitted by such a plasma to measure the optical aberrations, the subsequent aberration correction using a spatial light modulator and the fabrication of nanostructures using the corrected optical system.
Highlights
We show that an unaberrated focal spot corresponds to maximal plasma emission and demonstrate the correction of system and sample-induced aberrations using a spatial light modulator (SLM)
Bias aberrations ±bi Zi were introduced by the SLM and the corresponding plasma emission intensities Ii± measured by integrating over the corresponding region on the CCD (see Fig. 1(b))
To verify the aberration correction process, we introduced a known wavefront distortion using the SLM and measured it by using the plasma signal and the procedure explained above
Summary
OCIS codes: (090.1000) Aberration compensation; (140.3390) Laser materials processing; (130.2755) Glass waveguides; (250.5300) Photonic integrated circuits We show that an unaberrated focal spot corresponds to maximal plasma emission and demonstrate the correction of system and sample-induced aberrations using a spatial light modulator (SLM). This microscope was used to measure the intensity of the plasma emission from the laser focus.
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