Abstract
This paper presents an adaptive neuro-fuzzy approach based on first order function of fuzzy model for establishing the relationship between control factors and thin films properties of TiN/ZrN coatings on Si(100) wafer substrates. A statistical model was designed to explore the space of the processes by an orthogonal array scheme. Eight control factors of closed unbalance magnetron sputtering system were selected for modeling the process, such as interlayer material, argon and nitrogen flow rate, titanium and zirconium target current, rotation speed, work distance, and bias voltage. Analysis of variance (ANOVA) was carried out for determining the influence of control factors. In this study, with the application of ANOVA, the smallest effect of control factors was eliminated. The adaptive neuro-fuzzy inference system (ANFIS) was applied as a tool to model the deposited process with five significant control factors. The experimental results show that ANFIS demonstrates better accuracy than additive model for the film hardness. The root mean square error between prediction values and experimental values were archived to 0.04.
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