Adaptive defect and pattern detection in amplitude and phase structures via photorefractive four-wave mixing.

Abstract

This work comprises the theoretical and numerical validations of experimental work on pattern and defect detection of periodic amplitude and phase structures using four-wave mixing in photorefractive materials. The four-wave mixing optical processor uses intensity filtering in the Fourier domain. Specifically, the nonlinear transfer function describing four-wave mixing is modeled, and the theory for detection of amplitude and phase defects and dislocations are developed. Furthermore, numerical simulations are performed for these cases. The results show that this technique successfully detects the slightest defects clearly even with no prior enhancement. This technique should prove to be useful in quality control systems, production-line defect inspection, and e-beam lithography.