Abstract

Advances in x-radiation sources put greater demands on x-ray optics. Fabrication errors in optical elements lead to deformation of the radiation wavefront, which prevents diffraction-limited imaging of the source. A new adaptable x-ray phase compensator using refracting elements has been developed, fabricated, and tested. The compensator makes a sinusoidal correction to the x-ray wavefront with variable amplitude, period, and phase. The adaptable compensator was used to correct two planar compound refractive lenses and a Kirkpatrick–Baez mirror system on an x-ray beamline. Wavefront measurements showed a reduction in the rms wavefront error by a factor of seven for the lenses and three for the mirror system, reducing rms wavefront errors down to of order $ \lambda /100 $λ/100. This concept could be used with optics on existing x-ray beamlines to enable diffraction-limited focusing.

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