Abstract

Afterglows of R/x%N2 and R/x%(N2-5%H2) (R = Ar or He) flowing microwave discharges are characterized by optical emission spectroscopy. Absolute densities of N-atoms, N2(A) and N2(X,v>13) metastable molecules and N2+ ions and evaluated densities of NH and H are determined after calibration of the N-atom density by NO titration. New results on NH radical and H-atom relative densities are obtained by considering that the excitation of the NH(A) radiative state in the afterglow is produced by N2(X,v>13) + NH collisions. The interest of these results concerns the enhancement of surface nitriding by combined effects of N and H atoms inclusion in afterglow conditions.

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