Abstract
Photochemical reactions of the thymine containing polymers were studied and were applied as Deep-UV photoresists materials, which gave high resolution pattern of 0.3mμ.1 Pyrimidine polymers can also be applied as chemical amplification resists for microlithography. One of the pyrimidine polymers is a polycarbonate containing both thymine photodimer and tertialy alcohol units in the polymer main chain. Another polymer is a polyether containing acid sensitive alkoxypyrimidine units in the main chain. This paper deals with preparation of the acid sensitive polymer containing pyrimidine units, and with photosensitive acid catalytic reactions.
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