Abstract
The thickness of UV-irradiated films of poly[p-(tert-butoxycarbonyloxy)styrene] and poly(tert-butyl methacrylate) containing a photoacid generator as a chemically amplified photoresist was reduced by the deprotection of the side chain residues as a result of the acidolysis reaction catalyzed by a photogenerated acidic species. It was observed that the reduction of film thickness is spread laterally on a millimeter scale to unexposed areas upon heating in the presence of 3-phenyl-3,3-ethylenedioxy-1-propyl p-toluenesulfonate as an acid amplifier that displays the autocatalytic acidolysis referred to as acid proliferation. The enlargement of areas showing the thickness reduction was suppressed effectively by covering the films with a glass plate or a polymer film. This observation suggested that the acidolysis reaction of the films is caused predominantly by the migration of acid molecules originated from the acid amplifier through the air. This was confirmed by the transfer of acid molecules to another aci...
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