Abstract
X-ray ptychography, a powerful scanning lensless imaging technique, has become attractive for nondestructively imaging internal structures at nanoscale. Stage positioning overhead in conventional step-scan ptychography is one of the limiting factors on the imaging throughput. In this work, we demonstrate the use of advanced fly scan ptychography to achieve high-resolution ptychograms of modern integrated circuits on a large field-of-view at millimeter scale. By completely removing stage overheads between scan points, the imaging time for millimeter-size sample can be significantly reduced. Furthermore, we implement the orthogonal probe relaxation technique to overcome the variation of illumination across the large scan area as well as local vibrations. The capability of x-ray ptychography shown here is broadly applicable for various studies, which requires both high spatial resolution and large scan area.
Highlights
To pursue negligible positioning overhead under any circumstances, several groups12–14 have developed a so-called fly scan scheme in which objects move at a constant velocity during single exposure, reducing the idle time to detector’s readout time that can be a few microseconds for numerous pixel-array-detectors
We demonstrate the use of advanced fly scan ptychography to achieve high-resolution ptychograms of modern integrated circuits on a large field-of-view at millimeter scale
The problem is traditionally solved with the mixed-states ptychography algorithm15 that describes the fly scan diffraction pattern as an incoherent summation of diffraction intensities generated from multiple orthogonal probe modes
Summary
To pursue negligible positioning overhead under any circumstances, several groups12–14 have developed a so-called fly scan scheme in which objects move at a constant velocity during single exposure, reducing the idle time to detector’s readout time that can be a few microseconds for numerous pixel-array-detectors. We demonstrate the use of advanced fly scan ptychography to achieve high-resolution ptychograms of modern integrated circuits on a large field-of-view at millimeter scale.
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