Abstract
A fabrication method for making accurate double-height micromolds is presented. Fine features of the micromold are transferred to a three-dimensional poly-dimethylsiloxane (PDMS) microfluidic membrane. The accuracy of features is within 1.55% and the maximum aspect ratio is 7. In this work, the first layer of the micromolds is made directly on silicon wafers by inductively coupled plasma reactive ion etching (ICP-RIE). The second layer is added by photolithography of SU-8 negative photoresist on top of the first layer. This method allows the fabrication of micromolds having wall dimensions as small as 3 µm that was not previously achievable. Such dimensions are required in biological microfluidic systems to reduce the amount of chemicals or to confine cells to a desired position.
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