Abstract

In this paper, we propose an accurate automatic defect detection method using the quadtree decomposition on scanning electron microscope (SEM) images. The proposed method consists of five steps including alignment between the inspection and reference images, edge relaxation, defect candidate detection, multichannel integration, and defect scoring. Since the periodicity of semiconductor SEM images is usually high, alignment can be failed due to a lot of local minima. To resolve this problem, we propose the enhancement method of non-periodic areas in SEM images. Then, we propose an edge relaxation technique to minimize the falsely remained edges in the aligned and subtracted image due to different focusing and exposure between two images. Then, the defect candidates are detected by analyzing the inhomogeneity based on quadtree decomposition, which is enhanced by our outlier-robust decomposition rule and adaptive decomposition thresholding to prevent over/under decomposition. Whereas the conventional defect detection system focuses only on the intensity of defects, our method considers both the inhomogeneity and intensity of defects. Field test results demonstrated that the proposed method provided more accurate defect detection with faster speed as compared to the conventional system. The proposed method can much reduce the automatic defect review rework compared with the conventional system.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call