Absolute measurements of radiation damage in nanometer-thick films

Abstract

The problem of absolute measurements of radiation damage in films of nanometer thicknesses is addressed. Thin films of DNA (∼2-160 nm) are deposited onto glass substrates and irradiated with varying doses of 1.5-keV X-rays under dry N(2) at atmospheric pressure and room temperature. For each different thickness, the damage is assessed by measuring the loss of the supercoiled configuration as a function of incident photon fluence. From the exposure curves, the G-values are deduced, assuming that X-ray photons interacting with DNA deposit all of their energy in the film. The results show that the G-value (i.e. damage per unit of deposited energy) increases with film thickness and reaches a plateau at 30±5 nm. This thickness dependence provides a correction factor to estimate the actual G-value for films with thicknesses <30 nm thickness. Thus, the absolute values of the damage can be compared with that of films of any thickness under different experimental conditions.