Abstract
The change in the resistance of thin Ni films produced by the adsorption of H 2 was utilized to measure directly the isothermal adsorption-desorption kinetics for H 2 chemisorbed on Ni. The data is interpreted as showing that desorption from the chemisorbed state to the gas phase is bottlenecked by a precursor state of adsorbed molecular hydrogen. The absolute desorption rate for the precursor state has been measured over the temperature range 300–500°K.
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