Abstract

We have calibrated a 1.5m grazing incidence monochromator with the light of known wavelength at the advanced light source (ALS) of the Lawrence Berkeley National Laboratory (LBNL) using beamline 6.3.2. Several measurements in the 13–30nm wavelength range with well resolved monochromatic light were examined at ALS. Such precise measurements have enabled us to find the dependence of the efficiency as function of wavelengths for the EUV monochromator in the wavelength range of 10–80nm using previously and current determined sensitivities. We have used this calibrated monochromator for EUV diagnostics of a plasma source developed at LBNL. In particular, we have normalized previously measured EUV radiative lines arising from xenon (Xe) ions originating from charge state q=1–10 in the wavelength range of 10–16nm with special attention for the wavelength of 13.4nm which might have lithographic applications.

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