Abrupt ternary III–V metamorphic buffers

Abstract

Emerging quantum materials as well as novel traditional electronic and photonic materials may enable a new generation of information science devices if they can be synthesized on suitable substrates. Additionally, material and device designs may benefit from tunable properties through engineered epitaxial strain for the manipulation of the electronic character. In this work, three series of III–V ternary alloys, GaInSb, AlInSb, and InAsSb, are grown via molecular beam epitaxy on GaAs (001) substrates to explore the flexibility of abrupt metamorphic epitaxial layers with tunable lattice parameters between 6.135 and 6.479 Å. Their deposition on both homomorphic GaAs and pseudomorphic AlAs buffers is also explored. The structures of these alloys are characterized via reflection high-energy electron diffraction, high-resolution x-ray diffraction, atomic force microscopy, and transmission electron microscopy to assess their suitability as stable buffer layers with wide variability of accessible lattice parameters.