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Abstract
Fabrication of abrupt InGaP∕GaAs heterointerfaces has been difficult using metal organic vapor phase epitaxy (MOVPE) due to the exchange of P and As during the fabrication steps. An optimized gas-switching sequence to fabricate heterointerface of InGaP on GaAs layer by MOVPE was previously developed in which the unstable top surface layer of GaAs is stabilized and the exchange of P and As between InGaP and GaAs layers is suppressed. In this study, the effect of this optimized gas-switching sequence was quantitatively evaluated by using scanning transmission electron microscopy (STEM). Changes in atomic composition from GaAs to InGaP at the interface at the atomic layer level were revealed by using Z-contrast method in STEM. Quantitative evaluation using the Z-contrast method confirmed that the abruptness of the GaAs∕InGaP interface was improved by this optimized gas-switching sequence.
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