Abstract
Ultraviolet photocatalytic-assisted chemical mechanical polishing technology can effectively improve the processing efficiency and surface quality of single crystal SiC. In this paper, the chemical mechanical synergy (CMS) effects of TiO2 catalyzing H2O2 to synergistically remove single crystal 6H-SiC under ultraviolet irradiation were investigated by means of friction and wear. The ball-on-disk friction and wear test was carried out under two conditions M-Ⅰ (UV light for 20 min) and M-Ⅱ (UV light only in the last 10 min). The results showed that under UV light irradiation, anatase TiO2 exhibited photocatalytic and abrasive effects (including mending effect, rolling effect, ploughing effect, polishing effect and protective film effect) during the friction process. The longer the irradiation time, the stronger the chemical reaction on the oxidation of SiC by TiO2 catalyzing H2O2; the higher the TiO2 concentration, the greater the material removal of SiC. At last, the material removal model of single crystal SiC under the condition of ultraviolet light on TiO2 catalyzing H2O2 was established, and the synergistic effect of mechanics and chemistry was analyzed intuitively.
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