Abstract
Abnormal growth of “giant” grains in the millimeter range was observed in silver thin films with thicknesses of 2.0 and 2.4 μm. The effect depends on deposition temperature and deposition geometry. The microstructure and texture of as-deposited and annealed films have been characterized using X-ray, electron backscatter diffraction (EBSD) and focused ion beam (FIB) techniques. Abnormal grain growth is found whenever a special texture is formed during film deposition. Otherwise normal grain growth occurs. The texture type—and thus the grain growth mode—can be controlled by adjusting the process parameters. During abnormal grain growth, the initial 〈111〉 texture transforms completely into 〈001〉. Growth of 〈111〉-oriented grains stagnates at a size smaller than the film thickness with a non-columnar grain structure. This stagnation promotes orientation-selective growth of 〈001〉 grains.
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