Ablation Process of Silica Glass Induced by Laser Plasma Soft X-ray Irradiation

Abstract

Silica glass can be ablated using focused laser plasma soft X-rays. The ablation technique enables us to fabricate trenches with a width as narrow as 50 nm. In the present paper, we have investigated the nano-ablation process. The soft X-ray irradiation cause silica surface broken into almost atomic species. Ionic species have kinetic energies higher than that gained by heating up to the boiling point. We measured ablation depth as a function of soft X-ray fluence. The analysis of the depth revealed that soft X-rays are absorbed in silica surface with a effective aborption depth of 10 nm. The result leads to that the energy densty of the soft X-rays per unit volume at the threshold fluence is comparable to that required for breaking silica glass into atomic species. Futher, the results suggests that ablation occurs before diffusion of absorbed energy into the surroudning region. In addition to the energy absorption, repulssive force between ionic species may cause ablation of silica surface by soft X-ray irradiation. These properties of soft X-ray ablation may achieve nano-ablation of silica glass.