Abstract
Lateral shear interferometry is considered as a possible means for optical correction of wave fronts reconstructed from singly and doubly exposed holograms. Optical aberrations are eliminated in a moire pattern by superposing two lateral shear interferograms using waves diffracted by original holograms. It is shown that the singly exposed hologram allows compensation for only optical inhomogeneities due to the substrate, while the doubly exposed hologram also excludes aberrations due to the recording system. The experimental results supporting the efficiency of the method as applied to imperfect substrates of holograms are presented.
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