Abstract
Abstract We have recently installed the first JEOL 3100Z R005 microscope in Europe, a 300 kV (scanning) transmission electron microscope with aberration correctors for both focused and parallel beam illumination, a cold field-emission electron gun and a high-resolution imaging energy filter. This instrument delivers 0.5 A resolution in both planar illumination and scanning convergent beam illumination at 300 kV [1] and [2] and can form an electron beam ∼2 A in diameter which is intense enough (∼1nA) to perform chemical mapping using either electron energy-loss or energy-dispersive X-ray spectroscopy. We show an application to perovskite thin films, demonstrating that the reduced delocalisation and improved signal-to-noise ratio due to aberration correction allow us to determine layer and interface widths from cross-sections at true atomic resolution. This type of equipment will also be ideally suited to investigate the atomic structure and chemistry of polycrystalline thin films such as typically produced from sintering of nano-particles deposited onto suitable substrates.
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