Abstract
The general aberration theory for combined electromagnetic focusing-deflection systems with curved axes will be applied to a scanning electron microscopic system and an electron lithographic system. All third order geometric and first order chromatic aberrations have been calculated along rectilinear/curvilinear axes. The important identities between some aberration coefficients will be verified numerically. The geometric and chromatic aberrations calculated along the matching curvilinear axis will be compared with those along the rectilinear axis. The computational trials may be of help for explaining the mechanism of moving/swinging objective lens and variable axis lens systems.
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