Ab initio modeling study of boron diffusion in silicon

Abstract

We present investigations of boron diffusion in crystalline silicon using ab initio calculations (W. Windl et al., Phys. Rev. Lett. 83 (1999) 4345). Based on these results, a new mechanism for B diffusion mediated by Si self-interstitials was proposed. Rather than kick-out of B into a mobile channel-interstitial, one- or two-step diffusion mechanisms have been found for the different charge states. The predicted activation energy of 3.5–3.8 eV, migration barrier of 0.4–0.7 eV, and diffusion-length exponent of −0.6 to −0.2 eV are in excellent agreement with experiment. We also present results of ab initio calculations for the structure and energetics of boron-interstitial clusters in Si. We show how these first-principles results can be used to create a physical B diffusion model within a continuum simulator which has strongly enhanced predictive power in comparison to traditional diffusion models.